only cover on file

Advances in Cmp/polishing Technologies for the Manufacture of Electronic Devices

by Toshiro K. Doi, Ioan D. Marinescu, Syuhei Kurokawa

317 pages~6h read

only cover on file

Advances in Cmp/polishing Technologies for the Manufacture of Electronic Devices

by Toshiro K. Doi, Ioan D. Marinescu, Syuhei Kurokawa

317 pages~6h read

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§ Details

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Author

Toshiro K. Doi, Ioan D. Marinescu, Syuhei Kurokawa

Publisher

Elsevier

Pages

317

Editions

1 edition

ISBN

9781437778595

§ About the book

CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. --P. 4 of cover.

§ Keywords

themes & tags

Electrolytic polishing Grinding and polishing Chemical mechanical planarization TECHNOLOGY & ENGINEERING Technical & Manufacturing Industries & Trades

§ Where to read

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Open Library

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§ Editions

1 printing

Print · 2012

Elsevier

317 pages · 9781437778595 · English

❦

317 pages
№ 178042

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