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A
dvances in CMP Polishing Technologies
by
Toshiro Doi
,
Ioan D. Marinescu
,
Syuhei Kurokawa
328 pages
~6h read
‹
only cover on file
›
A
dvances in CMP Polishing Technologies
by
Toshiro Doi
,
Ioan D. Marinescu
,
Syuhei Kurokawa
328 pages
~6h read
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§ Details
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Author
Toshiro Doi, Ioan D. Marinescu, Syuhei Kurokawa
Publisher
Elsevier Science & Technology Books
Pages
328
Editions
2 editions
ISBN
9781437778601
§ Where to read
1 ways
O
Open Library
info
Details
§ Editions
2 printings
Print · 2011
Elsevier Science & Technology Books
328 pages · 9781437778601 · English
Paperback · 2018
William Andrew
328 pages · 9780128103562
❦
328 pages
№ 178041
9781437778601
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